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aluminum circle

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Aluminum Circle for cookware

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Metal alloy: 1xxx, 3xxx, 5xxx, 6xxx, 8xxx etc Temper: O – H112, T3 – T8, T351 – T851 Diameter: 80mm – 1600mm Thickness: 0.3mm – 4mm

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Aluminum disc circle for lighting

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Metal alloy: 1xxx, 3xxx, 5xxx, 6xxx, 8xxx etc Temper: O – H112, T3 – T8, T351 – T851 Diameter: 80mm – 1600mm Thickness: 0.3mm – 4mm

Aluminum disc circle for signs

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Metal alloy: 1xxx, 3xxx, 5xxx, 6xxx, 8xxx etc Temper: O – H112, T3 – T8, T351 – T851 Diameter: 80mm – 1600mm Thickness: 0.3mm – 4mm

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Aluminum disc circle for bottles

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Metal alloy: 1xxx, 3xxx, 5xxx, 6xxx, 8xxx etc Temper: O – H112, T3 – T8, T351 – T851 Diameter: 80mm – 1600mm Thickness: 0.3mm – 4mm

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Aluminum disc circle for vessels

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Metal alloy: 1xxx, 3xxx, 5xxx, 6xxx, 8xxx etc Temper: O – H112, T3 – T8, T351 – T851 Diameter: 80mm – 1600mm Thickness: 0.3mm – 4mm

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Custom thickness aluminum disc circle

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Metal alloy: 1xxx, 3xxx, 5xxx, 6xxx, 8xxx etc Temper: O – H112, T3 – T8, T351 – T851 Diameter: 80mm – 1600mm Thickness: 0.3mm – 4mm

Sputter Target

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2011-1-7 ·  Target Sputter 1Townsend Townsend discharge 2 3 (Arc) 4(Arc) Plasma:,。

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Disk or Annular Sputter Targets - Ted Pella

The disc or foil type sputter targets are available in 60, 57, 54, 50 and 19mm diameter. Most of the disc type targets are clamped to the target holder by a target clamping ; simply unscrew the clamping and change the target. The target diameter can be selected for sputter .

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Sputtering Target - an overview | ScienceDirect Topics

Since a sputtering target is an area source, sputter deposition has a substantial advantage to get uniform film thickness. However, even in the case of a planar substrate which can be set in parallel with a target surface, the finite size of the target causes the film thickness gradient on the substrate.

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Kurt J. Lesker Company | Tungsten W Sputtering Targets ...

* Suggested maximum power densities are based on using a sputter up orientation with optimal thermal transfer from target to the sputter cathode cooling well. Using other sputtering orientations or if there is a poor thermal interface between target to sputter cathode cooling well may require a reduction in suggested maximum power density and ...

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Sputtering Target Manufacturers - Thin Film Panel Process ...

Sputtering Target Manufacturers. Companies involved in Sputtering Target production, a key sourcing item for solar thin-film panel manufacturers. 111 Sputtering Target manufacturers are listed below. Solar Materials. Thin Film Panel Process.

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Sputter Target Erosion and its Effects on Long Duration .

2021-5-10 · sputter target and comparing coatings with targets at different levels of erosion. For our application of sputtering, this time dependent variation in sputter coating is crucial to understand, so that we can produce a high volume of higher quality shells that meet

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Home - Sputter Targets

2021-9-10 · The sputtering target specialists Welcome to SputterTargets.uk a division of Moorfield Nanotechnology. As industry leaders in high-vacuum PVD, CVD, and etch systems, we can offer a huge range of sputtering targets, as well as expert advice and guidance for your project. Whether you're looking for standard metal sputtering targets such as aluminium, and nickel, [.]

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Sputtering Targets | Tantalum | Properties

We offer different grades of tantalum sputter target plates, ranging from 99.95% purity to 99.995%, to meet the specific application requirements of our customers. We supply pure tungsten sputter target plates at purity levels of up to 99.95% at full density with fine uniform grain size through the thickness. Our pure sputter targets ...

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TiW Sputtering Target | Mitsubishi Materials Corporation ...

2020-11-5 · Advantages of TiW target from Mitsubishi Materials. Tungsten powder, which is one of raw materials for TiW targets, is manufactured at one of our group companies, therefore we are able to provide and keep the stable supply. High purity, High density, Fine structure;

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Sputtering Targets | Tantalum | Properties

We offer different grades of tantalum sputter target plates, ranging from 99.95% purity to 99.995%, to meet the specific application requirements of our customers. We supply pure tungsten sputter target plates at purity levels of up to 99.95% at full density with fine uniform grain size through the thickness. Our pure sputter targets ...

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Cesium (Cs) Sputtering Target | Stanford Advanced Materials

High-purity (99.999%) pure cesium sputtering target used for vacuum coating. SAM's Cs sputter targets, with high quality and competitive price, are widely used for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical .

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Sputter Target - an overview | ScienceDirect Topics

Andrew H. Simon, in Handbook of Thin Film Deposition (Third Edition), 2012 Tooling and Shielding Considerations. A primary consideration in the design of magnetron sputter sources is that there are no regions on the sputter target that are redeposited with target material during deposition [47].A magnetron design that fully erodes the entire target surface is said to have full-face erosion.

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Gallium (Ga) Sputtering Target Archives

SAM specializes in producing high purity Gallium (Ga) Sputtering Target for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. (949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake .

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Sputtering Targets - Testbourne Ltd

Sputter target materials can be generally supplied within the purity range of 99% to 99.9999% but the higher purities are more material dependent . Alloy Targets. Advancement in alloying techniques has enabled Testbourne to offer a wide range of .

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Sputter Coater Targets - emsdiasum

Sputter Coater Targets Sputter Coater Targets. The following targets are intended for our equipment and are stock items. All other targets are custom made and delivery is about one week. We are able to supply targets (foil with base) for the following sputtering units: .

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Sputtering Target Manufacturers | Bonding Suppliers ...

Bonding Services. Plasmaterials provides all metal bonding to affix sputtering targets to backing plates for systems which do not utilize a bolt-on target assembly. This proprietary process utilizes layers of low vapor pressure metals which have been applied to both the backing plate and the target and are then diffusion bonded together. This ...

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Gallium (Ga) Sputtering Target Archives

SAM specializes in producing high purity Gallium (Ga) Sputtering Target for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. (949) 407-8904 Mon - Fri 08:00 - 17:00 23661 .